Optosys | ZEISS | Axio Imager Vario - Upright Microscope for Wafer and Photomask Inspection
OptoSys Optische Komponenten und Systemlösungen GmbH
Robert-Bosch-Straße
764293 Darmstadt
Deutschland
Phone/Telefon: +49 6151 44329
Mail: info@optosys.eu
http://optosys.eu/wp/
Details
Optosys | ZEISS | Axio Imager Vario - Upright Microscope for Wafer and Photomask Inspection
The ZEISS Axio Imager Vario allows for precise analysis of a wide range of objects, from tiny MEMS sensors to large flat panel displays. Its unique column design provides exceptional stability, making it possible to examine extremely large samples. Moreover, the Axio Imager Vario is specifically certified for use in cleanrooms, making it ideal for highly sensitive applications.
Inspection of Large Samples and Cleanroom Certification
The inspection of wafers and photomasks often requires stringent cleanroom conditions to meet high cleanliness standards. The Axio Imager Vario meets these requirements with its certification according to DIN EN ISO 14644-1 for cleanroom class 5. This corresponds to the old class 100 according to FED STD 209E (1992).
Precision Focus at All Times
For analyzing reflective surfaces with low contrast, the Axio Imager Vario can be equipped with a highly efficient hardware auto focus system. This system ensures maximum accuracy in both reflected light and transmitted light applications. It automatically detects and compensates for changes in focus position, ensuring that even large samples remain precisely focused at all times.
Hardware Auto Focus for Various Applications
Precise focusing is critical in material research and industrial manufacturing. The Axio Imager Vario's focusing system ensures a maximum depth of field of up to 0.3 times and offers a focusing range of up to 12,000 µm. The autofocus can be used for applications in reflected light, transmitted light, brightfield, darkfield, polarization contrast, differential interference contrast, and oblique illumination.
Configurations
Reviews
