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ZEISS | Objective "Epiplan" IR 100x/0.9 Korr. (0-0.6) Si
This objective has a working distance of 0.35 mm at a cover glass thickness of 0.3 mm silicon.
Carl Zeiss Microscopy GmbH
ZEISS | Objective "Epiplan" IR 100x/0.9 Korr. (0-0.6) Si
No longer available.
| Article number | 442988-0000-000 |
|---|---|
| Magnification | 100× |
| Numerical aperture | 0.9 |
| Working distance | 0.35 at cover glass 0.3 mm |
| Cover glass thickness | 0 - 0.6 mm |
| Objective class | Epiplan |
| Immersion | Without Immersion |
| Thread | M27x0.75 thread |
| Reflected light | BrightField, Fluorescence |
| Application | Confocal Microscopy, NLO-IR / 2 Photon |
| Correction collar | Correction Ring |
| ZEISS Micro-Shop | https://www.micro-shop.zeiss.com/en/de/shop/objectives/442988-0000-000/Objective-Epiplan-IR-100x-0.9-Korr.-0-0.6-Si |
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Web: https://www.zeiss.com/microscopy
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ManufacturerCarl Zeiss Microscopy GmbH
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Description
This objective for incident light brightfield features the M 27 threaded mount! This objective has been designed particularly for the infrared spectral range between 900 nm and 1,200 nm and for IR backside inspection, i.e. observation through the silicon wafer. It is mainly used at 1,064 nm (Nd-YAG-Laser) with the IR-LSM.