LEJ - Leistungselektronik JENA GmbH | Luxyr Deep UV lighting system - Hg-Xe mixed gas discharge lighting consisting of lamp house with integrated ignition and ballast

With the LEJ Deep UV lighting system, you will experience extremely stable UV radiation due to low thermal drift and a highly stable DC power supply from our ballast.

Moreover, our system enables reproducible mechanical adjustment of the lamp, mirror, and collector. Thus, the LEJ Deep-UV system is suitable for wafer inspection or for illumination during optical review and analysis of photomasks, especially for structures and linewidths to detect defects and flaws.

Product Highlights:

• No thermal drift
• Reproducible mechanical adjustment
• Integrated high voltage ignition
• Compact robust lamp house
• Safety circuit function
• Operating hours counter

Application Areas:

• UV microscopy
• Photomask analysis
• Wafer inspection
• Disinfection
• UV curing